The Center for Nanoscale Systems (CNS) at Harvard University was created with a very clear vision: To provide a collaborative multi-disciplinary research environment to support of the creation and evolution of world-class nanoscience and technical expertise, for the Harvard research community as well as the larger community of external researchers both from academia and industry.

The Center for Nanoscale Systems' Nanofabrication Facility provides resource and staff support for fabricating and characterizing nanoscale devices and structures. Nanofabrication and growth are carried out in a 10,500 sq ft cleanroom.  The instruments available support an extensive range of fabrication and processing techniques, enabling a vast array of device structures from novel materials, ranging from NV center diamonds and other color center materials to TMDC atomic layer materials, III-V semiconductors, and biologically inspired systems.  Our facilities offer plasma enhanced and low pressure CVD systems for thin film growth, as well as an extensive development of Atomic Layer Deposition (ALD) technologies.  In addition, CNS teams have developed world-class expertise in engineered surfaces and super-hydrophobicity.  To fabricate nanoscale structures and devices, CNS has excellent facilities for high-resolution e-beam and optical lithography, including four e-beam writers, as well as a versatile set  of reactive ion etch (RIE) and other etching systems. For soft materials and biological and biomedical applications, CNS offers a Soft Lithography foundry that can make a wide variety of microfluidic and soft robotic structures.